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Temperature dependence of the electrical properties of organic thin-film transistors based on tetraphenyldibenzoperiflanthene deposited at different substrate temperatures: Experiment and modeling

机译:基于四苯基二苯并噻吩在不同衬底温度下沉积的有机薄膜晶体管电性能的温度依赖性:实验和建模

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摘要

A series of inverted-staggered (top contact) p-channel organic thin film transistors based on small molecule tetraphenyldibenzoperiflanthene (DBP) as an active layer have been fabricated by thermal evaporation at different substrate temperatures (300, 330, 360 and 390 K). In this work, these devices have been electrically characterized at different temperatures from 300 K to 370 K in steps of 10 K under vacuum. The influences of the temperature on the electrical performance of DBP-TFTs have been investigated in saturation regime. We found that the p-channel DBP-TFTs deposited at a substrate temperature (Tsub = 390 K) exhibited a better performance under a measurement temperature of 370 K, where µFET, Vth and the ratio current were approximately 8.5 × 10- 4 cm2 V- 1 s- 1, - 0.33 V and 3 × 106, respectively. The field effect mobility of these types of devices is strongly dependent on temperature and follows the simple Arrhenius law. Additionally, the temperature-dependent electrical measurements performed on these devices reveal a thermally-activated behavior for each substrate temperature. This suggests that the charge transport in the examined devices occurs via hopping between localized states. The obtained results demonstrate well that the deposition conditions of organic active layer can improve well the device performance. Finally, an analytical model has been developed to reproduce the dependence of the total resistance and the current-voltage characteristics with the temperature and to understand the charge transport in the DBP-TFTs. The obtained data are in good agreement with the experimental results for all fabricated devices.
机译:通过在不同的基板温度(300、330、360和390 K)下进行热蒸发,制造了一系列基于小分子四苯基二苯并环戊二烯(DBP)作为有源层的反向交错(顶部接触)p沟道有机薄膜晶体管。在这项工作中,这些设备已经在300 K至370 K的不同温度下,在真空下以10 K为步长进行了电气特性分析。在饱和状态下研究了温度对DBP-TFTs电性能的影响。我们发现,在衬底温度(Tsub = 390 K)下沉积的p沟道DBP-TFT在370 K的测量温度下表现出更好的性能,其中µFET,Vth和比率电流约为8.5×10-4 cm2 V -1 s-1,-0.33 V和3×106。这些类型的设备的场效应迁移率在很大程度上取决于温度,并且遵循简单的阿伦尼乌斯定律。另外,在这些设备上执行的与温度有关的电测量结果揭示了每个基板温度的热激活行为。这表明被检查设备中的电荷传输是通过局部状态之间的跳跃发生的。获得的结果很好地证明了有机活性层的沉积条件可以很好地改善器件性能。最后,已经开发出一种分析模型来重现总电阻和电流-电压特性与温度的关系,并了解DBP-TFT中的电荷传输。所获得的数据与所有制造的设备的实验结果非常吻合。

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